Electrodeposition of quaternary alloys in the presence of magnetic field

Alloy electrodeposition of two or more metals has been investigated to examine properties such as grain size, hardness, and corrosion resistance in relation to the parent metals. For example, the electrodeposition of Zn with iron group elements (i.e. Fe, Ni, Co) is applied mostly as finishing layers.Brenner [1] has classified the alloy electrodeposition of Zn with the iron group elements. The main problem with alloy electrodeposition is the anomalous behavior exhibited during the electrodeposition process. For instance, the Zn-iron group alloys face the problem of anomalous behavior where the less noble metal (i. e. Zn) is preferentially deposited compared to the more noble metals in the order Ni > Co > Fe. Several theories have been developed [2-4] to explain this anomalous behavior. Dahm and Caroll [5] attribute the anomalous behavior to the Hydroxide Suppression Mechanism (HSM). Their theory suggests that the more noble ions are hindered from electrodeposition by formation of hydroxides of the less noble ions. This theory is further based on the solubility constant (Ksp) of M (OH)2 that the Ksp of Zn < Fe < Co < Ni.Some investigators [6,7] have found that the pH value in the vicinity of the cathode was increased during alloy electrodeposition, while others [8-10] have disagreed with those results. Several investigators [7,8,11,12] have examined and explored this anomalous behavior by studying the pH, current density, potential range and temperature and its relevance to the anion concentration in the electrolyte. According to some, the electrodeposition rate of the more noble ions rise with the increase of pH of the electrolyte [6,13]. This anomalous behavior during electrodeposition diminishes with rising temperature [7]. In addition to the use HSM theory to explanation above, some authors [8-10,14,15] found that the Under Potential Deposition (UPD) of less noble ions can also lead to the above anomalous electrodeposition. At low potential, normal co-deposition t