A Emerging Technical Development in Next-Generation Low Cost Mass Fabrication for Nanolithography

Emerging Trends provides an insight into the developments in next-generation low cost nanolithography techniques . The study focuses mainly on the semiconductor market, which has the highest requirement for resolution and cost. This research paper covers key developments taking place in nanolithography required for fabricating future nanoscale semiconductor devices. In particular, potential technologies for fabricating smaller transistors is looked into, with leading extreme ultraviolet (EUV) Lithography, electron beam (E-Beam) direct writing, nanoimprinting and EOL Technique. An analytical overlook on research pipelines and market requirements is done to highlight the possible scenario in the coming years. The paper is written in a manner easily understood and allows the reader to assess different technologies from a top level view, while simultaneously providing comprehensive degree of information