Simulation methods of ion sheath dynamics in plasma source ion implantation

Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is dis-cussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some cal-culated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Fi-nally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.