MORPHOLOGIES AND STRUCTURES OF CHEMICAL VAPOR DEPOSITED DIAMOND FILMS AND FILM-SUBSTRATE INTERFACES
CVD金属石薄膜及膜——基界面形态

Polycrystalline diamond films were deposited on cemented carbide substrates using direct current plasma jet chemical vapor deposition (CVD) method. The structures, morphologies and compositions of diamond films and film-substrate interfaces have been characterized by XRD, Raman spectroscopy, SEM and EPMA. The results show that the faceted type diamond film with high crystallinity has good quality, high purity and excellent adhesion. Its film-substrate interface is dense and tortuous, and there is a significant mechanical anchoring effect between diamond film and substrate. The morphologies of substrate surfaces change greatly after deposition, there is several tens of microns in thickness cobalt-etched layer sequentially etched by plasma. The plasma etching leads to the cobalt-etched layer much rougher, which is beneficial to the diamond nucleation.