INVESTIGATION OF PHASE STRUCTURE AND PERFORMANCE OF (Ti, Al)N FILMS DEPOSITED BY ARC ION PLATING
电弧离子镀(Ti,Al)N复合薄膜的结构和性能研究

(Ti, A1)N films with different Al contents were deposited on 1CrllNi2W2MoV stainless steel by arc ion plating. As the aluminum content increased, the film structure changes from type Bl(NaCl) to type B4(ZnS). The preferred orientation of (Ti, A1)N films with B1 structure changes from (111) to (220) with the increase of Al content. The lattice parameter of (Ti, A1)N decreases with increasing Al content for both Bl and B4 structures. The hardness, adhesive strength and wear-resistant character of films first increase then decrease with the increase in Al content, which is related to the change of the film structure, preferred orientation and stress in the films. The introduction of Al dramatically improves the oxidation-resistance of (Ti,Al)N films.