A STUDY OF GRAIN ORIENTATION AND GROWTH IN IRON-SILICON BY ETCH PATTERNS

An investigation of the recrystallization orientation and growth in iron-silicon alloys containing 3.25 and 3.45 percent silicon has been made by using the etch patterns. The experimental results showed that the temperatures of intermediate and final annealing affected the end orientation. The cube texture in the specimens could be developed either through primary recrystallization or through secondary recrystallization. It has also been found that the cube texture was intensified not only by raising the annealing temperature, but also regulating the duration required for reaching the final temperature.