A New Spectrum Method for Measuring Film Uniformity
一种用于检测薄膜均匀性的光谱方法

A simple and effective method for obtaining the uniformity information of films is proposed. The method is based on the accurate measurement method for nano film thickness we given before.It firstly measures the spectrum of the film in different positions on a substrate containing a transition layer and then obtains the uniformity information of the film according to the interference peak difference. Compared with the traditional method,this method reduces the error resulting from the direct measurement of ...