Uniform Design Method of the Exposure Time of X-ray Picoseconds Framing Camera with Gated Microchannel Plate
微通道板选通X射线皮秒分幅相机曝光时间的均匀设计

The Uniform Design method is applied for the research of the X-ray Picoseconds Framing Camera with gated MCP (micro-channel plate), shortened form MCP-XPFC. On the bases of the theoretical models of picoseconds (ps) voltage pulse gated MCP-XPFC (L=0.5 mm, L/D=40), the fast forecast model of exposure time of MCP-XPFC is put forward. It can accurately replace the theoretical models within the range of experimental parameter and highly enhance the work efficiency. The curves of exposure time versus the width and amplitude of picoseconds high voltage pulse respectively are all the parabola type and there are the interaction on exposure time induced by the width and amplitude of gated pulse. The forecast model is checked by using two groups gated experimental pulses and the error is analyzed at last of this paper.