STUDY ON THE EFFECT OF INHIBITORS ON PASSIVE FILM OF REBAR BY PHOTOELECTROCHEMICAL METHOD
用光电化学的方法研究模拟混凝土孔溶液中缓蚀剂对钢筋钝化膜的影响

An in situ photoelectrochemical study was made to compare passive films on rebar formed in simulated concrete pore solution with or without inhibitors. The results indicated that the crystal structure and electron property of passive film were not changed due to adding composite inhibitors. It was still a n type amorphous semiconductive film. But pitting nucleus initiation was inhibited obviously and the growth rate of passive film was increased by adding inhibitors so that the composition of the film might be changed.