ELECTROLESS NICKEL PLATING BY INDUCED PHOTOSENSITIZER
光敏剂诱导化学镀镍的研究

Electroless nickel plating can be conducted at room temperature in solutions containing dye as photosensitizer under illumination . Effects of intensity and wavelength of incident light, concentration of photosensitizer, nickel ion and hypophosphite on the deposition rate were studied. The morphology of the deposit was different from that of deposits obtained at high temperatures without the photosensitizer. According to the results, the reaction mechanism is proposed.