Studies of Electron Transmission Film at the Input of MCP by AES
微通道板电子透射膜工艺的AES研究

Electron transmission films at the input of microchannel plate(MCP) are fabricated by cold basement sputtering and electrostatic film-posting technologies. The surface compositions of the electron transmission films at the input of MCP are measured respectively by Auger electron spectroscopy(AES). Some active channel surface composition and inner channel depth profile analyses are also made for MCPs through failing technique. It is found that the failing technique of cold basement sputtering causes the serious carbon contamination on the active channel surface of MCP, such MCPs cannot be rejuvenated. However, the failing technique of electrostatic film-posting has no effect on the active channel surface, such MCPs can be rejuvenated.