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光子学报 2004
The Design of Blazed Silicon Grating by Deflecting Crystal Orientation (111) Silicon Wafer
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Abstract:
The bulk silicon wet etching can be used to fabricate silicon grating. Wet etching depends on anisotropic property of silicon and the facets of gratings grooves can be formed by crystal surfaces of silicon.Blazed gratings for different spectral bands can be fabricated by this process.A method to fabricate blazed gratings by using deflecting crystal orientation (111) silicon wafer is designed. The topographies of silicon gratings have been measured by SEM, the experimental results indicate that the samples have good uniformity grooves and grating facets of excellent optical quality. Silicon blazed grating can be used to fabricate mini instruments or devices, such as micro spectrometer and filter etc.