Preparation and Characterization of Boron Thin Film on Iron Substrate

The adherent thermal layering was undertaken by chemical vapor deposition (CVD) method using saturated solution of boric acid in ultra pure CH3OH. The influence of temperature was studied by varying temperature from 100 to 600℃ during the process of boron deposition. The most optimum temperature was found to be 200℃. The effect of time span was observed from 6 to 120 h. The generation of micro or nano-scale thickness could be achieved by reducing time span of the experiment. The behavior of CVD was characterized by using scanning electron microscope, absorbance spectrohotometer and atomic emission spectrograph.