MICROSTRUCTURE AND OPTICAL PROPERTIES OF THE AIN FILMS DEPOSITED BY ION BEAM ENHANCED REACTIVE MAGNETRON SPUTTERING
离子束增强反应磁控溅射AIN膜的组织结构及光学特性

Microstructure,crystallography,electron structure and optical properties ofaluminum nitride film deposited by ion beam enhanced reactive magnetron sputtering were stu-died.The results show that the microstructure of the film is uniform and the grain size