Process optimization of a deep trench isolation structure for high voltage SOI devices
The Process Optimization of Deep Trench Isolation Structure for High Voltage SOI Devices

In this work, the process reasons for weak point formation of the deep trench on SOI wafer have been analyzed in detail. The optimized trench process is also proposed. It is found that there are two main reasons: one is over-etching laterally of silicon on the surface of buried oxide caused by fringe effect; the other is slowly growth rate of isolation oxide in the concave silicon corner of trench bottom. In order to improve the isolation performance of deep trench, two feasible ways for optimizing trench process are proposed. The improved process thickens the isolation oxide and rounds sharp silicon corner at weak point, increasing the applied voltage by 15-20V at the same leakage current. The proposed new trench isolation process has been verified in foundry’s 0.5-μm HV SOI technology.