Influences of N2 Flow Rate on the Crystalline Characteristics of GaN Films Deposited on Glass Substrate at Low Temperature
氮气流量对玻璃衬底上低温沉积GaN薄膜结晶性的影响

High c-axis oriented GaN films have been deposited on corning 7101 glass substrate by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD) at low temperature.Influences of N2 flow rate on the crystalline characteristics of the GaN films were investigated by reflection high energy electron diffraction (RHEED) in situ and X-ray diffraction (XRD).And the surface morphology and the optical properties of the GaN film were studied using atomic force microscope (AFM) and room temperature photoluminescence (PL) spectra.The results show that the surface morphology of the GaN film is smooth and its optical peaks are composed of a stronger ultraviolet near band emission and a rather weak green emission.