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OALib Journal期刊
ISSN: 2333-9721
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Analysis of trigger behavior of high voltage LDMOS under TLP and VFTLP stress
TLP和VFTLP应力下高压LDMOS的触发特性研究

Keywords: electrostatic discharge,transmission line pulsing,very fast transmission line pulsing,lateral doublediffused metal-oxide-semiconductor transistor
静电放电,传输线脉冲,快速传输线脉冲,横向双扩散金属氧化物半导体管

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Abstract:

The physical mechanisms triggering electrostatic discharge (ESD) in high voltage LDMOS power transistors (> 160 V) under transmission line pulsing (TLP) and very fast transmission line pulsing (VFTLP) stress are investigated by TCAD simulations using a set of macroscopic physical models related to previous studies implemented in Sentaurus Device. Under VFTLP stress, it is observed that the triggering voltage of the high voltage LDMOS obviously increases, which is a unique phenomenon compared with the low voltage ESD protection devices like NMOS and SCR. The relationship between the triggering voltage increase and the parasitic capacitances is also analyzed in detail. A compact equivalent circuit schematic is presented according to the investigated phenomena. An improved structure to alleviate this effect is also proposed and confirmed by the experiments.

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