Analysis of In-situ Monitoring Technique for Fabrication of High Quality Diffraction Gratings on GaAs Substrate
GaAs基片上制作优质衍射光栅的实时监测技术的分析

In developing processing of photoresist, high quality diffraction grating can be fabricatedon GaAs substrate by in-situ monitoring the diffraction intensity from the photoresist.The diffractionintensity variation with development is analyzed,and the optimum end point of developingis indicated in this paper.The analyses are in good agreement with the experiment results.