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Research on Slipcasting Process for BaTiO3-based Chip PTCR
片式BaTiO3基PTCR注浆成型研究

Keywords: chip PTCR,slipcasting,slurry
片式PTCR
,注浆成型,浆料

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Abstract:

In order to acquire highly concentrated BaTiO_3 slurry suitable for slipcasting process, the factors, that may influence the property of slurry, were investigated. The results obtained show that when pH=9 and the weight concentration of PVA and dispersant is 0.8% and 0.4% respectively, the solids loading as high as 80wt%(55vol%) can be achieved. In addition, The PTCR effect of chip PTCR formed by this slipcasting process was examined.

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