Computer simulation of the effect of polarization on the laser holography
计算机模拟偏振对激光全息的影响

A self-designed computer simulation of the multi-laser-beam interference is introduced to the study of the relationship between the polarization of light and the clarity of the interference pattern, which provides the optimal solution of the polarization on holographic lithography technology and improves the fabrication of sub-micrometer periodic structure much more efficiently. The experimental results are consistent with the results of computer simulation.