Optical properties of semiconductor quantum-well material using photonic crystal fabricated by micro-fabrication machine
半导体量子阱材料微加工光子晶体的光学特性

Two-dimensional photonic crystals in near infrared region were fabricated by using the focused ion beam (FIB) method and the method of electron-beam lithography (EBL) combined with dry etching. Both methods can fabricate perfect crystals, the method of FIB is simple,the other is more complicated. It is shown that the material with the photonic crystal fabricated by FIB has no fluorescence,on the other hand, the small-lattice photonic crystal made by EBL combined with dry etching can enhance the extraction efficiency two folds, though the photonic crystal has some disorder. The mechanisms of the enhanced-emission and the absence of emission are also discussed.