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物理学报 2002
Study on the temperature properties of 4H-SiC MOSFET
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Abstract:
The device structure and temperature properties of 4H-SiC MOSFET have been studied.The influence of the device's structure parameter on its properties is summarized.The properties are compared at different temperatures and the variations of saturation drain current,threshold voltage,transconductance,on-resistance with temperature are presented.Simulation results show that 4H-SiC MOSFET can operate at 800K with excellent temperature properties.