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物理学报  2002 

Study on the temperature properties of 4H-SiC MOSFET
4H-SiC MOSFET的温度特性研究

Keywords: H-SiC,MOSFET
4H-SiC
,MOSFET

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Abstract:

The device structure and temperature properties of 4H-SiC MOSFET have been studied.The influence of the device's structure parameter on its properties is summarized.The properties are compared at different temperatures and the variations of saturation drain current,threshold voltage,transconductance,on-resistance with temperature are presented.Simulation results show that 4H-SiC MOSFET can operate at 800K with excellent temperature properties.

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