The influence of annealing in vacuum on the structures of a-C:F thin films
真空退火对氟化非晶碳薄膜结构的影响

a-C:F films were deposited by electron cyclotron resonance plasma chemical vapor deposition (ECR-CVD) using CF-4 and C-6H-6 as source gases. In order to investigate the thermal stability, the films have been annealed in vacuum at several temperatures. The film thicknesses before and after annealing were measured, and the structures were analyzed using Fourier-transformed infrared spectrometer(FTIR) spectra. It shows that after annealing the films become thinner and the structures of the films deposited at lower microwave powers have more changes than ones of the films deposited at higher microwave powers. It means that the films prepared at higher microwave powers have better thermal stability.