Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films
a-C:F薄膜的热稳定性与光学带隙的关联

Fluorinated amorphous carbon films were deposited using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF 4 and C 6H 6 as source gas and were annealed in nitrogen ambience in order to investigate their thermal stability.The relative concentration of CC bond and optical bandgap were obtained by Fourier transform infrared (FTIR) spectroscopy and Ultraviolet-Visible(UV-VIS)spectrum respectively.It demonstratesd that there is a close relationship between relative concentration of CC bond and optical bandgap, and the films deposited at higher microwave power have a lower optical bandgap and better thermal stability.