全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...
物理学报  2004 

Morphological characterization and nanoindentation hardness scatter evaluation for Cu-W thin films based on wavelet transform
基于小波变换Cu-W薄膜表面形貌表征与硬度值分散性评价

Keywords: Cu-W thin films,surface morphology,wavelet transform,nanoindentation
Cu-W薄膜
,表面形貌,小波变换,纳米压入

Full-Text   Cite this paper   Add to My Lib

Abstract:

A strategy based on wavelet transform to describe surface morphology of thin films is presented in this paper. The evolution of surface morphology of Cu-W thin films with deposition time on silicon wafers was investigated by discrete wavelet transform (DWT) method. The results show that the surface morphology of the thin films is unstable until the sputtering time exceeds 10 min. The surface morphology variation of different thin films can be distinguished primarily by high frequency signals. A scattering of the nanoindentation hardness values, which results from the roughness of the thin films surface, can be characterized by the roughness defined by the surface texture based on wavelet transform.

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133