Investigation on Stress Distribution in a Key Equipment Subjected to Impact Loading based on a New-type Dynamic Photoelastic System
应用新型动光弹系统研究某设备受冲击载荷作用

When a structure is subjected to an impact loading, its stress distribution is entirely different from that under static loading. In order to study the internal dynamic stress distribution of a key device subjected to an impact loading, a new-type dynamic photoelastic system was used. The new-type dynamic photoelastic system is composed of part of traditional dynamic photoelastic test device, high-speed photography system, digital image processing system, laser light source and drop hammer impact loading device. Photoelastic model of the equipment was manufactured and applied to impact loading experimental study. The internal dynamic stress propagation and distribution and the maximum shear stress distribution were obtained. In addition, numerical simulation of stress state in the key equipment subjected to impact loading was performed based on ANSYS LS-DYNA software. The comparison between numerical and experimental results indicates that the average relative error is 5%, which verifies the reliability of this system and provides reference for model designing.