Preparation of BST nanocrystals embedded in SiO2 film by magnetron sputtering for nonvolatile memory applications

We develop a method that uses magnetron sputtering to fabricate barium strontium titanate (BST) nanocrystals embedded in dielectric SiO2 films. Transmission electron microscope images show that the BST nanocrystals have an average diameter of 5 nm and are well distributed in the SiO2 film. In addition, we also analyze the BST nanocrystals composition deviation during the sputtering process by electron dispersive spectroscopy.