Fabrication of tailored Bragg gratings by the phase mask dithering/moving technique

The most relevant aspects related to the phase mask dithering/moving method for the fabrication of complex Bragg grating designs are reviewed. Details for experimental implementation of this technique is presented, including theoretical analysis of the calibration functions for the correct dither/displacement. Results from tailored Bragg grating structures fabricated by this method are shown. Apodized Bragg gratings with modeled spatial profiles were implemented, resulting in side mode suppression levels of more than 20 dB in gratings showing transmission filtering level higher than 30 dB. Chirped gratings with the spectral bandwidth up to 4 nm, π-shift and sampled Bragg gratings with equalized peaks equally spaced by 0.8 nm (100 GHz) were also fabricated.