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Cálculo da taxa de ioniza??o por campo de um átomo próximo a uma superfície metálica: aplica??o ao microscópio i?nico de campoDOI: 10.1590/S1806-11172012000100004 Keywords: field ionization, field ion microscopy, wkb approximation. Abstract: in this work we calculate the ionization rate constant (ionization probability per unit of time) as a function of the applied field (we assume a uniform field) and the atom's distance from the metal surface. in order to calculate the probability of barrier penetration we use semiclassical (wkb)approximation. we utilize one-dimensional model potential which is chosen to be a good physical representation of the real system. in addition, the field ion microscope is approached in a elementary way.
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