全部 标题 作者
关键词 摘要

OALib Journal期刊
ISSN: 2333-9721
费用:99美元

查看量下载量

相关文章

更多...
Physics  2002 

Monte-Carlo Simulation of Pulsed Laser Deposition

DOI: 10.1103/PhysRevB.66.045408

Full-Text   Cite this paper   Add to My Lib

Abstract:

Using the Monte Carlo method, we have studied the pulsed laser deposition process at the sub-monolayer regime. In our simulations, dissociation of an atom from a cluster is incorporated. Our results indicate that the pulsed laser deposition resembles molecular beam epitaxy at very low intensity, and that it is characteristically different from molecular beam epitaxy at higher intensity. We have also obtained the island size distributions. The scaling function for the island size distribution for pulsed laser deposition is different from that of molecular beam epitaxy.

Full-Text

Contact Us

service@oalib.com

QQ:3279437679

WhatsApp +8615387084133