With the increasing bandwidth requirement in computing and signal processing, the inherent limitations in metallic interconnection are seriously threatening the future of traditional IC industry. Silicon photonics can provide a low-cost approach to overcome the bottleneck of the high data rate transmission by replacing the original electronic integrated circuits with photonic integrated circuits. Although the commercial promise has not been realized, this perspective gives huge impetus to the development of silicon photonics these years. This paper provides an overview of the progress and the state of the art of each component in silicon photonics, including waveguides, filters, modulators, detectors, and lasers, mainly in the last five years. 1. Introduction Silicon (Si) has been the mainstay of the electronics industry for more than 40 years and once revolutionized the way the world operates. By employing more precise lithography technology and multicore structures, the development of processors can still barely follow the Moore’s law. However, with increasing requirement of bandwidth, the parasitic effects in current metallic interconnection have gradually become a main obstacle for further improvements, since electric signal attenuation and power dissipation rise dramatically with higher data rate. To overcome the bottleneck of the high data rate transmission, one possible solution could be employing optical interconnect, in which the information signals are carried by photons instead. Compared with electrons, photons have zero rest mass and zero charge, which means that they can travel at velocity of light without the interference with electromagnetic field, so optical systems can theoretically achieve signal transmission with much higher data rate and better stability than electrical system. Therefore, it is highly desirable to replace traditional electrical circuits with optical circuits, and, under these motivations, a popular subject, called optoelectronic integrated circuit (OEIC), has been built since late 1980s. Si has an apparent window from the wavelength of 1100?nm to 7000?nm approximately, which is far from being limited to the near-infrared (IR) communication band of 1300–1550?nm. Some excellent optical properties, like large optical damage threshold and thermal conductivity, also appear in Si. Furthermore, today’s mature complementary metal-oxide semiconductor (CMOS) techniques could also allow low-cost, large-scale manufacturing for Si photonic devices. All of these reasons select Si as a remarkable candidate for photonics. The
References
[1]
R. A. Soref and J. P. Lorenzo, “Single-crystal silicon: a new material for 1.3 and 1.6?μm integrated-optical components,” Electronics Letters, vol. 21, no. 21, pp. 953–954, 1985.
[2]
R. A. Soref and B. R. Bennett, “Electrooptical effects in silicon,” IEEE Journal of Quantum Electronics, vol. 23, no. 1, pp. 123–129, 1987.
[3]
C. Z. Zhao, E. K. Liu, G. Z. Li, N. Li, and L. Guo, “Silicon raised strip waveguides based on silicon and silicon dioxide thermal bonding,” IEEE Photonics Technology Letters, vol. 9, no. 4, pp. 473–474, 1997.
[4]
C. Z. Zhao, E. K. Liu, G. Z. Li, and L. Guo, “Silicon-on-insulator optical intensity modulator based on waveguide-vanishing effect,” Electronics Letters, vol. 32, no. 18, pp. 1667–1668, 1996.
[5]
C. Z. Zhao, A. H. Chen, E. K. Liu, and G. Z. Li, “Silicon-on-insulator asymmetric optical switch based on total internal reflection,” IEEE Photonics Technology Letters, vol. 9, no. 8, pp. 1113–1115, 1997.
[6]
B. Jalali, S. Yegnanarayanan, T. Yoon, T. Yoshimoto, I. Rendina, and F. Coppinger, “Advances in silicon-on-insulator optoelectronics,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 4, no. 6, pp. 938–947, 1998.
[7]
L. Pavesi, “Will silicon be the photonics material of the third millennium?” Journal of Physics: Condensed Matter, vol. 15, pp. 1169–1196, 2005.
[8]
R. J. Deri and E. Kapon, “Low-loss III-V semiconductor optical waveguides,” IEEE Journal of Quantum Electronics, vol. 27, no. 3, pp. 626–640, 1991.
[9]
K. P. Yap, A. Delage, J. Lapointe, et al., “Correlation of scattering Loss, sidewall roughness and waveguide width in silicon-on-insulator (SOI) ridge waveguides,” Journal of Lightwave Technology, vol. 27, pp. 3999–4008, 2009.
[10]
J. I. Takahashi, T. Tsuchizawa, T. Watanabe, and S. -I. Itabashi, “Oxidation-induced improvement in the sidewall morphology and cross-sectional profile of silicon wire waveguides,” Journal of Vacuum Science and Technology B, vol. 22, no. 5, pp. 2522–2525, 2004.
[11]
F. Gao, Y. Wang, G. Cao, X. Jia, and F. Zhang, “Improvement of sidewall surface roughness in silicon-on-insulator rib waveguides,” Applied Physics B: Lasers and Optics, vol. 81, no. 5, pp. 691–694, 2005.
[12]
M. C. M. Lee and M. C. Wu, “Thermal annealing in Hydrogen for 3-D profile transformation on silicon-on-insulator and sidewall roughness reduction,” Journal of Microelectromechanical Systems, vol. 15, no. 2, pp. 338–343, 2006.
[13]
M. Borselli, T. J. Johnson, C. P. Michael, M. D. Henry, and O. Painter, “Surface encapsulation for low-loss silicon photonics,” Applied Physics Letters, vol. 91, no. 13, Article ID 131117, 2007.
[14]
F. Gao, Y. Wang, G. Cao, X. Jia, and F. Zhang, “Reduction of sidewall roughness in silicon-on-insulator rib waveguides,” Applied Surface Science, vol. 252, no. 14, pp. 5071–5075, 2006.
[15]
Q. Xia, P. F. Murphy, H. Gao, and S. Y. Chou, “Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction,” Nanotechnology, vol. 20, no. 34, Article ID 345302, 2009.
[16]
D. Taillaert, W. Bogaerts, P. Bienstman et al., “An out-of-plane grating coupler for efficient butt-coupling between compact planar waveguides and single-mode fibers,” IEEE Journal of Quantum Electronics, vol. 38, no. 7, pp. 949–955, 2002.
[17]
D. Taillaert, F. Van Laere, M. Ayre et al., “Grating couplers forcoupling between optical fibers and nanophotonic waveguides,” Japanese Journal of Applied Physics, vol. 45, no. 8 A, pp. 6071–6077, 2006.
[18]
X. Chen, C. Li, and H. K. Tsang, “Two dimensional silicon waveguide chirped grating couplers for vertical optical fibers,” Optics Communications, vol. 283, no. 10, pp. 2146–2149, 2010.
[19]
Y. Zhu, X. J. Xu, Z. Y. Li et al., “High efficiency and broad bandwidth grating coupler between nanophotonic waveguide and fibre,” Chinese Physics B, vol. 19, no. 1, Article ID 014219, 2010.
[20]
C. Alonso-Ramos, A. Ortega-Mo?ux, I. Molina-Fernández, P. Cheben, L. Zavargo-Peche, and R. Halir, “Efficient fiber-to-chip grating coupler for micrometric SOI rib waveguides,” Optics Express, vol. 18, no. 14, pp. 15189–15200, 2010.
[21]
L. Liu, M. Pu, Y. Kresten, and J. M. Hvam, “High-efficiency, large-bandwidth silicon-on-insulator grating coupler based on a fully-etched photonic crystal structure,” Applied Physics Letters, vol. 96, no. 5, Article ID 051126, 2010.
[22]
G. Gunn, “CMOS Photonics for high-speed interconnects,” Journal Microelectronics, vol. 26, pp. 58–66, 2006.
[23]
V. R. Almeida, R. R. Panepucci, and M. Lipson, “Nanotaper for compact mode conversion,” Optics Letters, vol. 28, no. 15, pp. 1302–1304, 2003.
[24]
S. J. McNab, N. Moll, and Y. A. Vlasov, “Ultra-low loss photonic integrated circuit with membrane-type photonic crystal waveguides,” Optics Express, vol. 11, no. 22, pp. 2927–2939, 2003.
[25]
T. Tsuchizawa, K. Yamada, H. Fukuda et al., “Microphotonics devices based on silicon microfabrication technology,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 11, no. 1, pp. 232–240, 2005.
[26]
M. Pu, L. Liu, H. Ou, K. Yvind, and J. M. Hvam, “Ultra-low-loss inverted taper coupler for silicon-on-insulator ridge waveguide,” Optics Communications, vol. 283, no. 19, pp. 3678–3682, 2010.
[27]
B. Jalali, “Can silicon change photonics?” Physica Status Solidi (A), vol. 205, no. 2, pp. 213–224, 2008.
[28]
Q. Fang, T. Y. Liow, J. F. Song et al., “Suspended optical fiber-to-waveguide mode size converter for Silicon photonics,” Optics Express, vol. 18, no. 8, pp. 7763–7769, 2010.
[29]
P. D. Trinh, S. Yegnanarayanan, F. Coppinger, and B. Jalali, “Silicon-on-insulator (SOI) phased-array wavelength multi/demultiplexer with extremely low-polarization sensitivity,” IEEE Photonics Technology Letters, vol. 9, no. 7, pp. 940–942, 1997.
[30]
S. Suzuki, S. Sumida, Y. Inoue, M. Ishii, and Y. Ohmori, “Polarisation-insensitive arrayed-waveguide gratings using dopant-rich silica-based glass with thermal expansion adjusted to Si substrate,” Electronics Letters, vol. 33, no. 13, pp. 1173–1174, 1997.
[31]
K. J. Vahala, “Optical microcavities,” Nature, vol. 424, no. 6950, pp. 839–846, 2003.
[32]
N. Daldosso and L. Pavesi, “Nanosilicon photonics,” Laser and Photonics Reviews, vol. 3, no. 6, pp. 508–534, 2009.
[33]
P. Dong, N. N. Feng, D. Feng et al., “GHz-bandwidth optical filters based on high-order silicon ring resonators,” Optics Express, vol. 18, no. 23, pp. 23784–23789, 2010.
[34]
M. A. Popovi?, T. Barwicz, M. R. Watts et al., “Multistage high-order microring-resonator add-drop filters,” Optics Letters, vol. 31, no. 17, pp. 2571–2573, 2006.
[35]
S. Xiao, M. H. Khan, H. Shen, and M. Qi, “Silicon-on-insulator microring add-drop filters with free spectral ranges over 30 nm,” Journal of Lightwave Technology, vol. 26, no. 2, pp. 228–236, 2008.
[36]
Y. Kokubun, “Vertically coupled microring resonator filter for integrated add/drop node,” IEICE Transactions on Electronics, vol. E88-C, no. 3, pp. 349–361, 2005.
[37]
K. Yamada, T. Shoji, T. Tsuchizawa, T. Watanabe, J. I. Takahashi, and S. I. Itabashi, “Silicon-wire-based ultrasmall lattice filters with wide free spectral ranges,” Optics Letters, vol. 28, no. 18, pp. 1663–1664, 2003.
[38]
A. W. Poon, C. Li, M. A. Ning, S. L. Lau, D. T. K. Tong, and V. G. Chigrinov, “Photonics filters, switches and subsystems for next-generation optical networks,” Transactions Hong Kong Institution of Engineers, vol. 11, no. 2, pp. 60–67, 2004.
[39]
M. C. M. Lee and M. C. Wu, “MEMS-actuated microdisk resonators with variable power coupling ratios,” IEEE Photonics Technology Letters, vol. 17, no. 5, pp. 1034–1036, 2005.
[40]
J. Yao and M. C. Wu, “Bandwidth-tunable add-drop filters based on micro-electro-mechanical-system actuated silicon microtoroidal resonators,” Optics Letters, vol. 34, no. 17, pp. 2557–2559, 2009.
[41]
M. T. Knapczyk, L. G. de Peralta, A. A. Bernussi, and H. Temkin, “Reconfigurable add-drop optical filter based on arrays of digital micromirrors,” Journal of Lightwave Technology, vol. 26, no. 2, pp. 237–242, 2008.
[42]
G. T. Reed, G. Mashanovich, F. Y. Gardes, and D. J. Thomson, “Silicon optical modulators,” Nature Photonics, vol. 4, no. 8, pp. 518–526, 2010.
[43]
G. T. Reed and C. E. Jason Png, “Silicon optical modulators,” Materials Today, vol. 8, no. 1, pp. 40–50, 2005.
[44]
F. G. Della Corte, M. Merenda, G. Cocorullo, M. Iodice, I. Rendina, and P. M. Sarro, “Modulation speed improvement in a Fabry-Perot thermo-optical modulator through a driving signal optimization technique,” Optical Engineering, vol. 48, no. 7, article no. 074601, 2009.
[45]
S. Y. Seo, J. Lee, J. H. Shin, and E. S. Kang, “The thermo-optic effect of Si nanocrystals in silicon-rich silicon oxide thin films,” Applied Physics Letters, vol. 85, no. 13, pp. 2526–2528, 2004.
[46]
A. Liu, R. Jones, L. Liao et al., “A high-speed silicon optical modulator based on a metal-oxide-semiconductor capacitor,” Nature, vol. 427, no. 6975, pp. 615–618, 2004.
[47]
Q. Xu, B. Schmidt, S. Pradhan, and M. Lipson, “Micrometre-scale silicon electro-optic modulator,” Nature, vol. 435, no. 7040, pp. 325–327, 2005.
[48]
T. Barwicz, H. Byun, F. Gan et al., “Silicon photonics for compact, energy-efficient interconnects,” Journal of Optical Communications and Networkin, vol. 6, no. 1, pp. 63–73, 2007.
[49]
R. A. Soref and B. R. Bennett, “Kramers-Kronig analysis of electro-optical switching in silicon,” in Integrated Optical Circuit Engineering IV, vol. 704 of Proceedings of SPIE, pp. 32–37, 1987.
[50]
A. Liu and M. Paniccia, “Advances in silicon photonic devices for silicon-based optoelectronic applications,” Physica E, vol. 35, no. 2, pp. 223–228, 2006.
[51]
C. E. Png, S. P. Chan, S. T. Lim, and G. T. Reed, “Optical phase modulators for MHz and GHz modulation in silicon-on-insulator (SOI),” Journal of Lightwave Technology, vol. 22, no. 6, pp. 1573–1582, 2004.
[52]
S. Manipatruni, Q. Xu, B. Schmidt, J. Shakya, and M. Lipson, “High speed carrier injection 18 Gb/s silicon micro-ring electro-optic modulator,” in Proceedings of the 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, (LEOS'07), pp. 537–538, October 2007.
[53]
W. M. J. Green, M. J. Rooks, L. Sekaric, and Y. A. Vlasov, “Ultra-compact, low RF power, 10 Gb/s silicon Mach-Zehnder modulator,” Optics Express, vol. 15, no. 25, pp. 17106–17113, 2007.
[54]
J. Zhao, Y. Zhao, W. Wang et al., “Analysis of the thermo-optic effect in lateral-carrier-injection SOI ridge waveguide devices,” Journal of Semiconductors, vol. 31, no. 6, Article ID 064009, 2010.
[55]
L. Liao, D. Samara-Rubio, M. Morse et al., “High speed silicon Mach-Zehnder modulator,” Optics Express, vol. 13, no. 8, pp. 3129–3135, 2005.
[56]
J. Basak, L. Liao, A. Liu et al., “Developments in gigascale silicon optical modulators using free carrier dispersion mechanisms,” Advances in Optical Technologies, vol. 2008, Article ID 678948, p. 10, 2008.
[57]
K. Kajikawa, T. Tabei, and H. Sunami, “An infrared silicon optical modulator of metal-oxide-semiconductor capacitor based on accumulation-carrier absorption,” Japanese Journal of Applied Physics, vol. 48, no. 4, Article ID 04C107, 2009.
[58]
F. Y. Gardes, G. T. Reed, N. G. Emerson, and C. E. Png, “A sub-micron depletion-type photonic modulator in silicon on insulator,” Optics Express, vol. 13, no. 22, pp. 8845–8854, 2005.
[59]
J. B. You, M. Park, J. W. Park, and G. Kim, “12.5?Gbps optical modulation of silicon racetrack resonator based on carrier-depletion in asymmetric p-n diode,” Optics Express, vol. 16, no. 22, pp. 18340–18344, 2008.
[60]
J. W. Park, J. B. You, I. G. Kim, and G. Kim, “High-modulation efficiency silicon Mach-Zehnder optical modulator based on carrier depletion in a PN diode,” Optics Express, vol. 17, no. 18, pp. 15520–15524, 2009.
[61]
L. Liao, A. Liu, D. Rubin et al., “40?Gbit/s silicon optical modulator for high-speed applications,” Electronics Letters, vol. 43, no. 22, pp. 1196–1197, 2007.
[62]
A. Liu, L. Liao, D. Rubin et al., “Recent development in a high-speed silicon optical modulator based on reverse-biased pn diode in a silicon waveguide,” Semiconductor Science and Technology, vol. 23, no. 6, Article ID 064001, 2008.
[63]
Y. H. Kuo, Y. K. Lee, Y. Ge et al., “Quantum-confined stark effect in Ge/SiGe quantum wells on Si for optical modulators,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 12, no. 6, pp. 1503–1512, 2006.
[64]
P. Chaisakul, D. Marris-Morini, G. Isella et al., “Quantum-confined Stark effect measurements in Ge/SiGe quantum-well structures,” Optics Letters, vol. 35, no. 17, pp. 2913–2915, 2010.
[65]
Y. Rong, Y. Ge, Y. Huo et al., “Quantum-confined stark effect in Ge/SiGe quantum wells on Si,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 16, no. 1, Article ID 5272202, pp. 85–92, 2010.
[66]
S. Fathpour and B. Jalali, “Energy harvesting in silicon optical modulators,” Optics Express, vol. 14, no. 22, pp. 10795–10799, 2006.
[67]
K. Noguchi, “Ultra-high-speed LiNbO3 modulators,” Journal of Optical and Fiber Communications Reports, vol. 4, no. 1, pp. 1–13, 2007.
[68]
D. Janner, D. Tulli, M. García-Granda, M. Belmonte, and V. Pruneri, “Micro-structured integrated electro-optic LiNbO3 modulators,” Laser and Photonics Reviews, vol. 3, no. 3, pp. 301–313, 2009.
[69]
J. Clark and G. Lanzani, “Organic photonics for communications,” Nature Photonics, vol. 4, no. 7, pp. 438–446, 2010.
[70]
J. Leuthold, C. Koos, and W. Freude, “Nonlinear silicon photonics,” Nature Photonics, vol. 4, no. 8, pp. 535–544, 2010.
[71]
J. Leuthold, W. Freude, J. M. Brosi et al., “Silicon organic hybrid technology - A platform for practical nonlinear optics,” Proceedings of the IEEE, vol. 97, no. 7, Article ID 5075753, pp. 1304–1315, 2009.
[72]
M. Hochberg, T. Baehr-Jones, G. Wang et al., “Terahertz all-optical modulation in a silicon-polymer hybrid system,” Nature Materials, vol. 5, no. 9, pp. 703–709, 2006.
[73]
B. Jalali, M. Paniccia, and G. Reed, “Silicon photonics,” IEEE Microwave Magazine, vol. 7, no. 3, pp. 58–68, 2006.
[74]
M. Safavi-Naeini, D. R. Franklin, M. L. F. Lerch et al., “Evaluation of silicon detectors with integrated JFET for biomedical applications,” IEEE Transactions on Nuclear Science, vol. 56, no. 3, Article ID 5076049, pp. 1051–1055, 2009.
[75]
L. Bolanos, M. Boscardin, A. E. Cabal et al., “A digital X-ray imaging system based on silicon strip detectors working in edge-on configuration,” Nuclear Instruments and Methods in Physics Research, Section A, vol. 608, no. 3, pp. 410–416, 2009.
[76]
P. Burger, M. Keters, O. Evrard, and L. van Buul, “Industrial silicon detectors, advancements in planar technology,” Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 591, no. 1, pp. 1–5, 2008.
[77]
F. Amorini, V. Sipala, G. Cardella et al., “A new monolithic silicon detector telescope with bidimensional sensitivity for imaging applications,” Nuclear Physics A, vol. 834, no. 1–4, pp. 758c–760c, 2010.
[78]
M. Casalino, “Silicon resonant cavity enhanced photodetector based on the internal photoemission effect at 1.55 μm fabrication and characterization,” Applied Physics Letters, vol. 92, no. 25, Article ID 251104, 3 pages, 2008.
[79]
M. Casalino, L. Sirleto, L. Moretti, F. Della Corte, and I. Rendina, “Design of a silicon RCE Schottky photodetector working at 1.55 μm,” Journal of Luminescence, vol. 121, no. 2, pp. 399–402, 2006.
[80]
S. Zhu, M. B. Yu, G. Q. Lo, and D. L. Kwong, “Near-infrared waveguide-based nickel silicide Schottky-barrier photodetector for optical communications,” Applied Physics Letters, vol. 92, no. 8, Article ID 081103, 2008.
[81]
E. Budianu, M. Purica, F. Iacomi, C. Baban, P. Prepelita, and E. Manea, “Silicon metal-semiconductor-metal photodetector with zinc oxide transparent conducting electrodes,” Thin Solid Films, vol. 516, no. 7, pp. 1629–1633, 2008.
[82]
S. R. J. Brueck, V. Diadiuk, T. Jones, and W. Lenth, “Enhanced quantum efficiency internal photoemission detectors by grating coupling to surface plasma waves,” Applied Physics Letters, vol. 46, no. 10, pp. 915–917, 1985.
[83]
K. M. Torosian, A. S. Karakashian, and Y. Y. Teng, “Surface plasma-enhanced internal photoemission in gallium arsenide Schottky diodes,” Applied Optics, vol. 2, pp. 2650–2652, 1987.
[84]
A. Akbari, R. N. Tait, and P. Berini, “Surface plasmon waveguide Schottky detector,” Optics Express, vol. 18, no. 8, pp. 8505–8514, 2010.
[85]
C. Scales, I. Breukelaar, and P. Berini, “Surface-plasmon Schottky contact detector based on a symmetric metal stripe in silicon,” Optics Letters, vol. 35, no. 4, pp. 529–531, 2010.
[86]
A. Akbari and P. Berini, “Schottky contact surface-plasmon detector integrated with an asymmetric metal stripe waveguide,” Applied Physics Letters, vol. 95, no. 2, Article ID 021104, 2009.
[87]
Z. Sheng, L. Liu, J. Brouckaert, S. He, and D. Van Thourhout, “InGaAs PIN photodetectors integrated on silicon-on-insulator waveguides,” Optics Express, vol. 18, no. 2, pp. 1756–1761, 2010.
[88]
J. Brouckaert, G. Roelkens, D. Van Thourhout, and R. Baets, “Thin-film III-V photodetectors integrated on silicon-on-insulator photonic ICs,” Journal of Lightwave Technology, vol. 25, no. 4, pp. 1053–1060, 2007.
[89]
A. D. Stiff-Roberts, “Quantum-dot infrared photodetectors: a review,” Journal of Nanophotonics, vol. 3, no. 1, 2009.
[90]
A. V. Barve, S. J. Lee, S. K. Noh, and S. Krishna, “Review of current progress in quantum dot infrared photodetectors,” Laser and Photonics Reviews, vol. 4, no. 6, pp. 738–750, 2010.
[91]
H. Schneider, H. C. Liu, S. Winnerl, O. Drachenko, M. Helm, and J. Faist, “Room-temperature midinfrared two-photon photodetector,” Physical Review B, vol. 93, no. 10, Article ID 101114, 2008.
[92]
H. C. Luan, D. R. Lim, K. K. Lee et al., “High-quality Ge epilayers on Si with low threading-dislocation densities,” Applied Physics Letters, vol. 75, no. 19, pp. 2909–2911, 1999.
[93]
J. Michel, J. Liu, and L. C. Kimerling, “High-performance Ge-on-Si photodetectors,” Nature Photonics, vol. 4, no. 8, pp. 527–534, 2010.
[94]
M. Yamaguchi, M. Tachikawa, M. Sugo, S. Kondo, and Y. Itoh, “Analysis for dislocation density reduction in selective area grown GaAs films on Si substrates,” Applied Physics Letters, vol. 56, no. 1, pp. 27–29, 1990.
[95]
L. Vivien, J. Osmond, J. M. Fédéli et al., “42 GHz p.i.n germanium photodetector integrated in a silicon-on-insulator waveguide,” Optics Express, vol. 17, no. 8, pp. 6252–6257, 2009.
[96]
D. Feng, S. Liao, P. Dong et al., “High-speed Ge photodetector monolithically integrated with large cross-section silicon-on-insulator waveguide,” Applied Physics Letters, vol. 95, no. 26, Article ID 261105, 2009.
[97]
M. Beals, J. Michel, J. F. Liu et al., “Process flow innovations for photonic device integration in CMOS,” in Silicon Photonics III, vol. 6898 of Proceedings of SPIE, San Jose, Calif, USA, January 2008.
[98]
T. Yin, R. Cohen, M. M. Morse et al., “31?GHz Ge n-i-p waveguide photodetectors on Silicon-on-Insulator substrate,” Optics Express, vol. 15, no. 21, pp. 13965–13971, 2007.
[99]
D. Ahn, C. Y. Hong, J. Liu et al., “High performance, waveguide integrated Ge photodetectors,” Optics Express, vol. 15, no. 7, pp. 3916–3921, 2007.
[100]
Y. Kang, H. D. Liu, M. Morse et al., “Monolithic germanium/silicon avalanche photodiodes with 340GHz gain-bandwidth product,” Nature Photonics, vol. 3, no. 1, pp. 59–63, 2009.
[101]
W. S. Zaoui, H. W. Chen, J. E. Bowers et al., “Frequency response and bandwidth enhancement in Ge/Si avalanche photodiodes with over 840?GHz gain-bandwidth-product,” Optics Express, vol. 17, no. 15, pp. 12641–12649, 2009.
[102]
Y. Kang, Y. Saado, M. Morse et al., “Ge/Si waveguide avalanche photodiodes on SOI substrates for high speed communication,” ECS Transactions, vol. 33, no. 6, pp. 757–764, 2010.
[103]
I. Prochazka, “Semiconducting single photon detectors: the state of the art,” Physica Status Solidi C, vol. 2, no. 5, pp. 1524–1532, 2005.
[104]
M. S. Carroll, K. Childs, R. Jarecki, T. Bauer, and K. Saiz, “Ge-Si separate absorption and multiplication avalanche photodiode for Geiger mode single photon detection,” Applied Physics Letters, vol. 93, no. 18, Article ID 183511, 2008.
[105]
Z. Yuan, A. Anopchenko, N. Daldosso et al., “Silicon nanocrystals as an enabling material for silicon photonics,” Proceedings of the IEEE, vol. 97, no. 7, Article ID 5075761, pp. 1250–1268, 2009.
[106]
D. Liang and J. E. Bowers, “Recent progress in lasers on silicon,” Nature Photonics, vol. 4, no. 8, pp. 511–517, 2010.
[107]
B. Jalali, “Making silicon lase,” Scientific American, vol. 296, no. 2, pp. 58–65, 2007.
[108]
L. T. Canham, “Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers,” Applied Physics Letters, vol. 57, no. 10, pp. 1046–1048, 1990.
[109]
L. Pavesi, L. Dal Negro, C. Mazzoleni, G. Franzò, and F. Priolo, “Optical gain in silicon nanocrystals,” Nature, vol. 408, no. 6811, pp. 440–444, 2000.
[110]
J. Ruan, P. M. Fauchet, L. Dal Negro, M. Cazzanelli, and L. Pavesi, “Stimulated emission in nanocrystalline silicon superlattices,” Applied Physics Letters, vol. 83, no. 26, pp. 5479–5481, 2003.
[111]
A. Irrera, D. Pacifici, M. Miritello et al., “Electroluminescence properties of light emitting devices based on silicon nanocrystals,” Physica E, vol. 16, no. 3-4, pp. 395–399, 2003.
[112]
R. J. Walters, G. I. Bourianoff, and H. A. Atwater, “Field-effect electroluminescence in silicon nanocrystals,” Nature Materials, vol. 4, no. 2, pp. 143–146, 2005.
[113]
A. J. Kenyon, “Erbium in silicon,” Semiconductor Science and Technology, vol. 20, no. 12, pp. R65–R84, 2005.
[114]
C. E. Chryssou, A. J. Kenyon, and C. W. Pitt, “Investigation of energy exchange between silicon nanocrystals and Er3+ in silica,” Materials Science and Engineering B, vol. 81, no. 1-3, pp. 16–18, 2001.
[115]
I. Izeddin, D. Timmerman, T. Gregorkiewicz et al., “Energy transfer in Er-doped SiO2 sensitized with Si nanocrystals,” Virtual Journal of Nanoscale Science & Technology, vol. 78, no. 3, Article ID 035327, 2008.
[116]
K. Choy, F. Lenz, X. X. Liang, F. Marsiglio, and A. Meldrum, “Geometrical effects in the energy transfer mechanism for silicon nanocrystals and Er3+,” Applied Physics Letters, vol. 93, no. 26, Article ID 261109, 2008.
[117]
O. Savchyn, K. R. Coffey, and P. G. Kik, “Determination of optimum Si excess concentration in Er-doped Si-rich SiO2 for optical amplification at 1.54 μm,” Applied Physics Letters, vol. 97, no. 20, Article ID 201107, 2010.
[118]
H. S. Han, S. Y. Seo, and J. H. Shin, “Optical gain at 1.54 μm in erbium-doped silicon nanocluster sensitized waveguide,” Applied Physics Letters, vol. 79, no. 27, pp. 4568–4570, 2001.
[119]
A. Pitanti, D. Navarro-Urrios, R. Guider et al., “Further improvements in Er3+ coupled to Si nanoclusters rib waveguides,” in Silicon Photonics and Photonic Integrated Circuits, vol. 6996 of Proceedings of SPIE, April 2008.
[120]
B. Garrido, C. García, S. Y. Seo et al., “Excitable Er fraction and quenching phenomena in Er-doped SiO2 layers containing Si nanoclusters,” Physical Review B, vol. 76, no. 24, Article ID 245308, 2007.
[121]
R. J. Kashtiban, U. Bangert, I. F. Crowe, M. Halsall, A. J. Harvey, and M. Gass, “Study of erbium-doped silicon nanocrystals in silica,” Journal of Physics: Conference Series, vol. 241, article 012097, 2010.
[122]
O. Jambois, Y. Berencen, K. Hijazi et al., “Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions,” Virtual Journal of Nanoscale Science & Technology, vol. 20, article no. 063526, 2009.
[123]
O. Jambois, F. Gourbilleau, A. J. Kenyon, J. Montserrat, R. Rizk, and B. Garrido, “Towards population inversion of electrically pumped Er ions sensitized by Si nanoclusters,” Optics Express, vol. 18, no. 3, pp. 2230–2235, 2010.
[124]
A. Kanjilal, L. Rebohle, W. Skorupa, and M. Helm, “Correlation between the microstructure and electroluminescence properties of Er-doped metal-oxide semiconductor structures,” Applied Physics Letters, vol. 94, no. 10, Article ID 101916, 2009.
[125]
R. Claps, D. Dimitropoulos, Y. Han, and B. Jalali, “Observation of Raman emission in silicon waveguides at 1.54 μm,” Optics Express, vol. 10, no. 22, pp. 1305–1313, 2002.
[126]
O. Boyraz and B. Jalali, “Demonstration of a silicon Raman laser,” Optics Express, vol. 12, no. 21, pp. 5269–5273, 2004.
[127]
O. Boyraz and B. Jalali, “Demonstration of directly modulated silicon Raman laser,” Optics Express, vol. 13, no. 3, pp. 796–800, 2005.
[128]
H. Rong, R. Jones, A. Liu et al., “A continuous-wave Raman silicon laser,” Nature, vol. 433, no. 7027, pp. 725–728, 2005.
[129]
B. Jalali, V. Raghunathan, D. Dimitropoulos, and O. Boyraz, “Raman-based silicon photonics,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 12, no. 3, pp. 412–421, 2006.
[130]
B. Jalali, V. Raghunathan, R. Shori, S. Fathpour, D. Dimitropoulos, and O. Stafsudd, “Prospects for silicon mid-IR Raman lasers,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 12, no. 6, pp. 1618–1626, 2006.
[131]
R. Jones, H. Rong, A. Liu et al., “Net continuous wave optical gain in a low loss silicon-on-insulator waveguide by stimulated Raman scattering,” Optics Express, vol. 13, no. 2, pp. 519–525, 2005.
[132]
W. D. Walters and A. P. Knights, “Application of defect engineering to silicon Raman lasers and amplifiers,” Journal of Materials Science: Materials in Electronics, vol. 20, no. 1, pp. S48–S53, 2009.
[133]
Y. Huang, P. Shum, and C. Lin, “Proposal for loss reduction and output enhancement of silicon Raman laser using bi-directional pumping scheme,” Optics Communications, vol. 283, no. 7, pp. 1389–1393, 2010.
[134]
H. Rong, S. Xu, Y. H. Kuo et al., “Low-threshold continuous-wave Raman silicon laser,” Nature Photonics, vol. 1, no. 4, pp. 232–237, 2007.
[135]
A. D. Bristow, N. Rotenberg, and H. M. Van Driel, “Two-photon absorption and Kerr coefficients of silicon for 850–2200?nm,” Applied Physics Letters, vol. 90, no. 19, Article ID 191104, 2007.
[136]
V. Raghunathan, D. Borlaug, R. R. Rice, and B. Jalali, “Demonstration of a mid-infrared silicon Raman amplifier,” Optics Express, vol. 15, no. 22, pp. 14355–14362, 2007.
[137]
X. Liu, R. M. Osgood, Y. A. Vlasov, and W. M. J. Green, “Mid-infrared optical parametric amplifier using silicon nanophotonic waveguides,” Nature Photonics, vol. 4, no. 8, pp. 557–560, 2010.
[138]
S. Zlatanovic, J. S. Park, S. Moro et al., “Mid-infrared wavelength conversion in silicon waveguides using ultracompact telecom-band-derived pump source,” Nature Photonics, vol. 4, no. 8, pp. 561–564, 2010.
[139]
B. Jalali, “Silicon photonics: nonlinear optics in the mid-infrared,” Nature Photonics, vol. 4, no. 8, pp. 506–508, 2010.
[140]
D. Liang, J. E. Bowers, D. C. Oakley et al., “High-quality 150?mm InP-to-silicon epitaxial transfer for silicon photonic integrated circuits,” Electrochemical and Solid-State Letters, vol. 12, no. 4, pp. H101–H104, 2009.
[141]
D. Liang and J. E. Bowers, “Highly efficient vertical outgassing channels for low-temperature InP-to-silicon direct wafer bonding on the silicon-on-insulator substrate,” Journal of Vacuum Science and Technology B, vol. 26, no. 4, pp. 1560–1568, 2008.
[142]
G. Roelkens, D. Van Thourhout, R. Baets, R. N?tzel, and M. Smit, “Laser emission and photodetection in an InP/InGaAsP layer integrated on and coupled to a Silicon-on-Insulator waveguide circuit,” Optics Express, vol. 14, no. 18, pp. 8154–8159, 2006.
[143]
J. Van Campenhout, L. Liu, P. Rojo Romeo et al., “A compact SOI-integrated multiwavelength laser source based on cascaded InP microdisks,” IEEE Photonics Technology Letters, vol. 20, no. 16, pp. 1345–1347, 2008.
[144]
G. Roelkens, L. Liu, D. Liang et al., “III-V/silicon photonics for on-chip and intra-chip optical interconnects,” Laser and Photonics Reviews, vol. 4, no. 6, pp. 751–779, 2010.
[145]
K. Ohira, K. Kobayashi, N. Iizuka et al., “On-chip optical interconnection by using integrated III-V laser diode and photodetector with silicon waveguide,” Optics Express, vol. 18, no. 15, pp. 15440–15447, 2010.
[146]
M. E. Groenert, C. W. Leitz, A. J. Pitera et al., “Monolithic integration of room-temperature cw GaAs/AlGaAs lasers on Si substrates via relaxed graded GeSi buffer layers,” Journal of Applied Physics, vol. 93, no. 1, pp. 362–367, 2003.
[147]
L. Cerutti, J. B. Rodriguez, and E. Tournie, “GaSb-based laser, monolithically grown on silicon substrate, emitting at 1.55,” IEEE Photonics Technology Letters, vol. 22, pp. 553–555, 2010.
[148]
Z. Mi, P. Bhattacharya, J. Yang, and K. P. Pipe, “Room-temperature self-organised in0.5Ga0.5As quantum dot laser on silicon,” Electronics Letters, vol. 41, no. 13, pp. 742–744, 2005.
[149]
J. Liu, X. Sun, D. Pan et al., “Tensile-strained, n-type Ge as a gain medium for monolithic laser integration on Si,” Optics Express, vol. 15, no. 18, pp. 11272–11277, 2007.
[150]
Y. Ishikawa, K. Wada, D. D. Cannon, J. Liu, H. C. Luan, and L. C. Kimerling, “Strain-induced band gap shrinkage in Ge grown on Si substrate,” Applied Physics Letters, vol. 82, no. 13, pp. 2044–2046, 2003.
[151]
J. Liu, D. D. Cannon, K. Wada et al., “Silicidation-induced band gap shrinkage in Ge epitaxial films on Si,” Applied Physics Letters, vol. 84, no. 5, pp. 660–662, 2004.
[152]
S. L. Cheng, G. Shambat, J. Lu et al., “Characterizations of direct band gap photoluminescence and electroluminescence from epi-Ge on Si,” ECS Transactions, vol. 33, no. 6, pp. 545–554, 2010.
[153]
X. Sun, J. Liu, L. C. Kimerling, and J. Michel, “Toward a germanium laser for integrated silicon photonics,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 16, no. 1, Article ID 5286843, pp. 124–131, 2010.
[154]
X. Sun, J. Liu, L. C. Kimerling, and J. Michel, “Direct gap photoluminescence of n-type tensile-strained Ge-on-Si,” Applied Physics Letters, vol. 95, no. 1, Article ID 011911, 2009.
[155]
X. Sun, J. Liu, L. C. Kimerling, and J. Michel, “Room-temperature direct bandgap electroluminesence from Ge-on-Si light-emitting diodes,” Optics Letters, vol. 34, no. 8, pp. 1198–1200, 2009.
[156]
S. L. Cheng, J. Lu, G. Shambat et al., “Room temperature 1.6 μm electroluminescence from Ge light emitting diode on Si substrate,” Optics Express, vol. 17, no. 12, pp. 10019–10024, 2009.
[157]
J. Liu, X. Sun, R. Camacho-Aguilera, L. C. Kimerling, and J. Michel, “Ge-on-Si laser operating at room temperature,” Optics Letters, vol. 35, no. 5, pp. 679–681, 2010.
[158]
A. Liu, L. Liao, Y. Chetrit et al., “Wavelength division multiplexing based photonic integrated circuits on silicon-on-insulator platform,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 16, no. 1, Article ID 5340692, pp. 23–32, 2010.
[159]
TechView, “Optical breakthroughs put 40/100 gigabit on the fast track,” Electronic Design, vol. 58, no. 7, pp. 17–22, 2010.
[160]
D. A. B. Miller, “Optical interconnects to electronic chips,” Applied Optics, vol. 49, no. 25, pp. F59–F70, 2010.
[161]
L. D. Paulson, “IBM project proposes using light to make chips faster,” Computer, vol. 44, no. 2, pp. 14–17, 2011.
[162]
D. McGrath, “Intel is developing optical chip-to-chip interconnects,” Electronic Engineering Times, vol. 1556, p. 39, 2009.
[163]
G. Freymann, A. Ledermann, M. Thiel et al., “Three-dimensional nanostructures for photonics,” Advanced Functional Materials, vol. 20, no. 7, pp. 1038–1052, 2010.
[164]
A. Densmore, M. Vachon, D. -X. Xu et al., “Silicon photonic wire biosensor array for multiplexed real-time and label-free molecular detection,” Virtual Journal for Biomedical Optics, vol. 5, no. 23, pp. 3598–3600, 2009.
[165]
T. Claes, J. G. Molera, K. De Vos, E. Schacht, R. Baets, and P. Bienstman, “Label-free biosensing with a slot-waveguide-based ring resonator in silicon on insulator,” IEEE Photonics Letters, vol. 1, pp. 197–204, 2009.
[166]
S. Janz, A. Densmore, D. X. Xu et al., “Silicon-based microphotonics for biosensing applications,” NATO Science for Peace and Security Series B, pp. 167–194, 2008.
[167]
J. T. Robinson, L. Chen, and M. Lipson, “On-chip gas detection in silicon optical microcavities,” Optics Express, vol. 16, no. 6, pp. 4296–4301, 2008.
[168]
J. H. Schmid, W. Sinclair, J. García et al., “Silicon-on-insulator guided mode resonant grating for evanescent field molecular sensing,” Optics Express, vol. 17, no. 20, pp. 18371–18380, 2009.
[169]
V. Torres-Costa and R. J. Martín-Palma, “Application of nanostructured porous silicon in the field of optics. A review,” Journal of Materials Science, vol. 45, no. 11, pp. 2823–2838, 2010.