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Sensors  2012 

Fabrication and Characteristics of an nc-Si/c-Si Heterojunction MOSFETs Pressure Sensor

DOI: 10.3390/s120506369

Keywords: nc-Si/c-Si heterojunction, MOSFETs pressure sensor, MEMS technology, CMOS process

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Abstract:

A novel nc-Si/c-Si heterojunction MOSFETs pressure sensor is proposed in this paper, with four p-MOSFETs with nc-Si/c-Si heterojunction as source and drain. The four p-MOSFETs are designed and fabricated on a square silicon membrane by CMOS process and MEMS technology where channel resistances of the four nc-Si/c-Si heterojunction MOSFETs form a Wheatstone bridge. When the additional pressure is P, the nc-Si/c-Si heterojunction MOSFETs pressure sensor can measure this additional pressure P. The experimental results show that when the supply voltage is 3 V, length-width (L:W) ratio is 2:1, and the silicon membrane thickness is 75 μm, the full scale output voltage of the pressure sensor is 15.50 mV at room temperature, and pressure sensitivity is 0.097 mV/kPa. When the supply voltage and L:W ratio are the same as the above, and the silicon membrane thickness is 45 μm, the full scale output voltage is 43.05 mV, and pressure sensitivity is 2.153 mV/kPa. Therefore, the sensor has higher sensitivity and good temperature characteristics compared to the traditional piezoresistive pressure sensor.

References

[1]  Kanda, Y.; Yasukawa, A. Optimum design considerations for silicon piezoresistive pressure sensors. Sens. Actuat. A 1997, 62, 539–542.
[2]  Sun, Y.C.; Gao, Z.; Tian, L.Q.; Zhang, Y. Modelling of the reverse current and its effects on the thermal drift of the offset voltage for piezoresistive pressure sensors. Sens. Actuat. A 2004, 116, 125–132.
[3]  Pedersen, T.; Fragiacomo, G.; Hansen, O.; Thomsen, E.V. Highly sensitive micromachined capacitive pressure sensor with reduced hysteresis and low parasitic capacitance. Sens. Actuat. A 2009, 154, 35–41.
[4]  Catling, D.C. High-sensitivity silicon capacitive sensors for measuring medium-vacuum gas pressures. Sens. Actuat. A 1998, 64, 157–164.
[5]  He, F.; Huang, Q.-A.; Qin, M. A silicon directly bonded capacitive absolute pressure sensor. Sens. Actuat. A 2007, 135, 507–514.
[6]  Hynes, E.; Oneill, M.; McAuliffer, D.; Berney, H.; Lane, W.A.; Kelly, G.; Hill, M. Development and characterisation of a surface micromachined FET pressure sensor on a CMOS process. Sens. Actuat. A 1999, 76, 283–292.
[7]  Bradley, A.T.; Jaeger, R.C.; Suhling, J.C.; O'Connor, K.J. Piezoresistive characteristics of short channel MOSFETs on (100) silicon. IEEE Trans. Electron. Devices 2001, 48, 2009–2015.
[8]  Vatedka, R.; Takao, H.; Sawada, K.; Ishida, M. Effect of high drain voltage on stress sensitivity in nMOSFETs. Sens. Actuat. A 2007, 140, 89–93.
[9]  Dai, C.L.; Kao, P.H.; Tai, Y.W.; Wu, C.C. Micro FET pressure sensor manufactured using CMOS-MEMS technique. Microelectron. J 2008, 39, 744–749.
[10]  Sallese, J.-M.; Grabinski, W.; Meyer, V.; Bassin, C.; Fazan, P. Electrical modeling of a pressure sensor MOSFET. Sens. Actuat. A 2001, 94, 53–58.
[11]  Wen, D. Sensitivity analysis of junction field effect-pressure Halltron. Rev. Sci. Instrum 1995, 66, 251–255.
[12]  Yan, H.; Feng, Y.; Xu, J.; Bian, J. MOS field effect transistor pressure microsensor. J. Transducer Technol 2001, 5, 19–21.
[13]  Li, J.; Yue, R.; Liu, L. MOSFET Differential Amplifier with Input Pair and Active Load Pair being Stress-Sensitive Both. Proceeding of 6th International IEEE Conference Solid State and Integrated Circuit Technology, Shanghai, China, 22–25 October 2001; 2, pp. 812–815.
[14]  Zhang, Z.; Zhang, Y.; Liu, L.; Ren, T. A Novel MEMS Pressure Sensor with MOSFET on Chip. Proceeding of IEEE Conference Sensors, Lecce, Italy, 26–29 October 2008; pp. 1564–1567.
[15]  Jachowicz, R.S.; Azgin, Z.M. FET pressure sensor and iterative method for modeling of the device. Sens. Actuat. A 2002, 97–98, 369–378.
[16]  Fernández-Bola?os, M.; Abelé, N.; Pott, V.; Bouvet, D.; Racine, G-A.; Quero, J.M.; Ionescu, A.M. Polyimide sacrificial layer for SOI SG-MOSFET pressure sensor. Microelectron. Eng 2006, 83, 1185–1188.
[17]  Garcia, V.; Fruett, F. A mechanical-stress sensitive differential amplifier. Sens. Actuat. A 2006, 132, 8–13.

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