This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.
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