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Applied Physics 2021
生长在PLA基片上的Ni81Fe19薄膜的磁性能研究
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Abstract:
随着电子器件微型化、集成化和柔性化技术的发展，NiFe薄膜器件与人体及其它器件集成化的过程对NiFe薄膜在不同基片，特别是几何弯曲基片上的异质生长提出了新的需求。本文研究了生长在聚乳酸(PLA)基片上Ni81Fe19薄膜的磁学性能，研究了基片的弯曲方向、弯曲程度和弯曲次数对薄膜磁性的影响。结果表明NiFe薄膜的磁性主要受基片弯曲带来的几何形状的影响。薄膜的矫顽力随弯曲半径的增加而增加，薄膜的弯曲半径可以小于1.5 mm。随着弯曲次数的增加，薄膜的矫顽力在略微增加后保持稳定，薄膜的最大弯曲次数可以达到2000次。
With the development of miniaturization, integration and flexibility of electronic devices, the integration of NiFe thin film devices with other devices puts forward new requirements for the growth of NiFe thin films on different substrates, especially on geometrically bent substrates. The magnetic properties of Ni81Fe19 films grown on polylactic acid (PLA) films were studied. The effects of bending direction, bending degree and bending times on the magnetic properties of the films were studied. The results show that the magnetic properties of NiFe films are mainly affected by the geometry of the substrate. The coercivity increases with the increase of the bending radius, which can be less than 1.5 mm. With the increase of the bending times, the coercivity of the film keeps stable after a slight increase, and the maximum bending times of the film can reach 2000.
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