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双色光发射电子显微镜成像金纳米环等离激元场分布
Imaging the Plasmonic Field Distribution of the Gold Nanoring by Two-Color Photoemission Electron Microscopy

DOI: 10.12677/APP.2020.101005, PP. 38-46

Keywords: 等离激元，光发射电子显微镜，金纳米环，双色量子通道
Plasmons, Photoemission Electron Microscope, Gold Nanoring, Two-Color Quantum Channel

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Abstract:

本文利用双色–光发射电子显微镜(Photoemission Electron Microscopy, PEEM)成像了电子束加工的金纳米环样品的等离激元近场分布。利用双色的实验方法有效地打开了双色量子通道，从而导致发射电子的非线性阶次从3.80降低到1.85，并且光辐射电子的产额显著增加。通过近场PEEM图像表明，由于存在缺陷激发的强烈干扰，掩盖了结构的场分布信息。进一步分析缺陷位置处电子非线性阶次，发现纳米环缺陷位置处电子的非线性阶次下降程度显著低于非缺陷处。双色PEEM成像的技术对于等离激元近场成像等相关研究的发展起到推动作用。
In this paper, a two-color photoemission emission electron microscope (PEEM) was used to image the Plasmonic near-field distribution of the gold nanoring samples processed by the electron beam. The two-color experimental method effectively opened the two-color quantum channel, which caused the non-linear order of the emission electrons to be reduced from 3.80 to 1.85, and the photoemission electron increased significantly. The near-field PEEM image shows that the near-field distribution information of the structure is masked because of the strong interference of defect excitation. Further analysis of the non-linear order of the electrons at the defect location reveals that the degree of non-linear decrease of the electrons at the nanoring defect location is significantly lower than that at the non-defective location. The two-color PEEM imaging technology plays an important role in the development of the plasmons near-field imaging.

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