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Clusters Deposition on Surface an Atomic Scale Study by Computer Simulation Method

DOI: 10.4236/jamp.2019.710156, PP. 2303-2314

Keywords: Computer Simulation, Low Energy, Cluster, Deposition, Slowing down, Molecular Dynamics, Parallelization, Embedded Atom Model

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Abstract:

The investigation is generalized to clusters with sizes up to 3000 atoms, covering this way the range of sizes experimentally available for low energy cluster beam deposition. The atomic scale modeling is carried on by both Molecular Dynamics and Metropolis Monte Carlo. This represents a huge series of simulations (175 cases) to which further calculations are added by spot when finer tuning of the parameters is necessary. Analyzing the results is a major task which is still in progress. This way, not only a realistic range of sizes is covered, but also the whole range of compositions and the temperature range relevant to the solid and the liquid states.

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