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含能材料  2013 

Al/Ni和Al/Ti纳米多层薄膜制备与表征

DOI: 10.3969/j.issn.1006-9941.2013.06.012

Keywords: 军事化学与烟火技术,Al/Ni纳米多层薄膜,Al/Ti纳米多层薄膜,磁控溅射,结构表征,热分析

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Abstract:

用磁控溅射法制备了Al/Ni、Al/Ti纳米多层薄膜。用场发射扫描电子显微镜(FESEM)、原子力显微镜(AFM)和X-射线衍射仪(XRD)对其进行了结构表征和成分分析。用差示扫描量热法(DSC)测定了纳米多层薄膜的反应放热量。结果表明:工作压力为0.4Pa,Al、Ni、Ti溅射功率分别为200,220,180W条件下制备的Al/Ni、Al/Ti多层薄膜表面均匀致密,无尖锐峰,层状结构分明,组成成分分别为Al、Ni和Al、Ti单质状态;Al/Ni、Al/Ti多层薄膜放热量分别为1134.64,918.36J·g-1,达到理论值的82.2%,80.7%。

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