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材料工程  2010 

CdGeAs2晶体的蚀坑形貌观察

, PP. 74-76

Keywords: 非线性红外光学晶体,砷锗镉,腐蚀剂,蚀坑形貌

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Abstract:

采用金相显微镜和扫描电镜观察了垂直布里奇曼法生长的新型红外非线性光学晶体砷锗镉(CdGeAs2)单晶片(101)面蚀坑形貌.选择机械研磨、物理抛光及质量分数为3%溴甲醇在室温下对晶片化学抛光1min左右的工艺,获得了表面平整无划痕的CdGeAs2晶片.报道了一种新的CGA晶体择优腐蚀剂,其组成为HClHNO3H2O=111(体积比),室温下腐蚀晶片30s左右后在金相显微镜和扫描电镜下观察到CdGeAs2晶体(101)晶面的腐蚀坑,蚀坑形貌呈取向一致的等腰三角形,边界清晰,具有立体感,并从理论上分析讨论了(101)面三角形蚀坑的形成原因.

References

[1]  RUD'YU V,USHAKOVA T N.Physical properties of CdGeAs2 crystal grown by solid-state synthesis[J].Semiconductors,1999,33(11):1193-1195.
[2]  BYER R L,KILDAL H,FEIGELSON R S.CdGeAs2-a new nonlinear crystal phase matchable at 10.6μm[J].Applied Physics Letters,1971,19(7):237-240.
[3]  VODOPYANOV K L.Efficient deference frequency generation of 7-20μm radiation in CdGeAs2[J].Optical Letters,1998,15:1096-1098.
[4]  FEIGELSON R S,FOUTE R K.Vertical Bridgman growth of CdGeAs2 with control of interface shape and orientation[J].Journal of Crystal Growth,1980,49:261-273.
[5]  NAGASHIO T,WATCHARAPASORN A,ZAWILSKI K T,et al.Correlation between dislocation etch pits and optical absorption in CdGeAs2[J].Crystal Growth,2004,269(2-4):195-206.
[6]  于丰亮,赵北君,朱世富,等.对红外非线性光学材料硫镓银(AgGaS2)晶体形貌的观察研究[J].四川大学学报:自然科学版,2001,38:30-33.
[7]  BAI L,GARCES N,YANG N,et al.Optical and EPR study of defects in CdGeAs2[J].Material Research Society Symposium Proceedings,2003,744:537.
[8]  HALLIBURTON L E,EDWARDS G J,SCHUNEMANN P G,et al.Electron paramagnetic resonance spectra in as-grown CdGeAs2[J].Journal of Applied Physics,1995,77(1):435-437.
[9]  VAIPOLIN A,OSNANOV A,TRETYAKOV D N.Chemical aspects of diamond-like II-IV-V2 compound[J].Negro Matter,1967,13:260-265.

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