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OALib Journal期刊
ISSN: 2333-9721
费用：99美元
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CVDSiC致密表面涂层制备及表征
, PP. 3-6
Keywords: 化学气相沉积,SiC涂层,制备工艺,性能表征
Abstract:
考察了沉积温度、稀释气体流量对化学气相沉积(CVD)SiC涂层的显微结构及晶体结构的影响,分析得出沉积温度为1100℃,稀释气体Ar流量<400mL/min时,制备的SiC涂层晶体结构完整、致密。在该制备工艺条件下沉积的SiC涂层密度为3.204g/cm3,显微硬度为HV4459.2,弹性模量为471GPa,涂层具有优异的光学加工性能,光学加工后表面粗糙度为0.429nm,能满足光学应用的要求。
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