OALib Journal期刊
ISSN: 2333-9721
费用:99美元
高折射率聚合物-无机纳米光学杂化材料的设计与制备及其应用
DOI: 10.3724/SP.J.1105.2013.12412 , PP. 589-599
Keywords: 高折射率 ,聚合物材料 ,无机纳米材料 ,光学杂化材料
Abstract:
传统的高折射率聚合物光学材料,可以通过向聚合物中引入一些芳香环,含硫基团以及除氟以外的其他卤素原子来提高聚合物光学材料的折射率,但是就目前的研究现状来看,这类纯聚合物光学材料的折射率一般都低于1.8.而将具有高折射率的无机纳米粒子引入到聚合物中,所制备的聚合物-无机纳米光学材料的折射率能够达到1.8以上.而且这类高折射率聚合物-无机纳米光学杂化材料同时具有高分子光学材料和无机材料的双重优点,具有广泛的应用前景.鉴于当前高折射率聚合物-无机纳米光学杂化材料发展之迅速和其研究与开发的重要性,并结合目前国内外的研究现状,本文就高折射率聚合物-无机纳米光学杂化材料的设计、制备方法及其相关应用做一个比较系统的介绍,同时对这类材料在未来研究中所应注意的问题也提出了相应的看法.
References
[1] 1 Yang Bai(杨柏), Lü Changli(吕长利),Shen Jiacong(沈家骢).Polymer optical materials with high properties(高性能聚合物光学材料).1st ed.Beijing(北京):Chemical Industry Press(化学工业出版社),2005.9~13
[2] 2 Lü C L,Yang B.J Mater Chem,2009,19:2884~2901
[3] 5 Fukuzaki N,Higashihara T,Ando A,Ueda M.Macromolecules,2010,43:1836~1843
[4] 11 Kypriandou-Leodidou T,Caseri W,Suter U W.J Mater Res,1994,98:8992~8997
[5] 12 Kypriandou-Leodidou T,Althausa H J,Wysera1 Y,Vettera1 D,Büchlera1 M,Caseria1 W,Suter U W.J Mater Res,1997,12:2198~2206
[6] 14 Cheng Y R,Lü C L,Lin Z,Liu Y F,Guan C,Lü H,Yang B.J Mater Chem,2008,18:4062~4068
[7] 15 Guan C,Lü C L,Cheng Y R,Song S Y,Yang B.J Mater Chem,2009,19:617~621
[8] 16 Lin Z,Cheng Y R,Lü H,Zhang L,Yang B.Yang B.Polymer,2010,51:5424~5431
[9] 27 Bae W J,Trikeriotis M,Sha J,Schwartz E L,Rodriguez R,Zimmerman P,Giannelis E P,Ober C K.J Mater Chem,2010,20:5186~5189
[10] 28 Luo K Q,Zhou S X,Wu L M,Gu G X.Langmuir,2008,24:11497~11505
[11] 29 Luo K Q,Zhou S X,Wu L M.The Solid Film,2009,517:5974~5980
[12] 30 Tao P,Li Y,Rungta A,Viswanath A,Gao J N,Benicewicz B C,Siegel R W,Schadler L S.J Mater Chem,2011,21:18623~18629
[13] 33 Mont F W,Kim J K,Schubert M F,Schubert E F,Siegel R W.J Appl Phys,2008,103:083120.1~6
[14] 34 Kim J S,Yang S,Bae B S.Chem Mater,2010,22:3549~3555
[15] 35 Lin Y H,You J P,Lin Y C,Tran N T,Shi F G.IEEE Trans Comp Pack Tech,2010,33:761~766
[16] 37 Liu J G,Nakamura Y,Ogura T,Shibasaki Y J,Ando S J,Ueda M.Chem Mater,2008,20:273~281
[17] 3 Liu J G,Ueda M.J Mater Chem,2009,19:8907~8919
[18] 4 You N H,Higashihara T,Yasuo S,Ando A,Ueda M.Polym Chem,2010,1:480~484
[19] 6 You N H,Higashihara T,Oishi Y,Ando A,Ueda M.Macromolecules,2010,43:4613~4615
[20] 7 Zimmerman L,Weibel M,Caseri W,Suter U W,Walther P.Polym Adv Technol,1993,4:1~7
[21] 8 Lü C L,Guan C,Liu Y F,Cheng Y R,Yang B.Chem Mater,2005,17:2448~2454
[22] 9 Webel W,Caseri W,Suter U W,Kiss H,Wehrli E.Polym Adv Technol,1991,2:75~80
[23] 10 Zimmerman L,Weibel M,Caseri W,Suter U W.J Mater Res,1993,8:1742~1748
[24] 13 Lü C L,Cheng Y R,Liu Y F,Liu F,Yang B.Adv Mater,2006,18:1188~1192
[25] 17 Xue P F,Wang J B,Bao Y B,Li Q Y,Wu C F.Chinese J Polym Sci,2012,30(5):652~663
[26] 18 Xue P F,Wang J B,Bao Y B,Li Q Y,Wu C F.New J Chem,2012,36:903~910
[27] 19 Zhang G Y,Zhang H,Zhang X R,Zhu S J,Zhang L,Meng Q N,Wang M Y,Li Y F,Yang B.J Mater Chem,2012,22:21218~21224
[28] 20 Papadimitrakopoulos F,Wisniecki P,Bhagwagar D E.Chem Mater,1997,9:2928~2933
[29] 21 Lü C L,Cui Z C,Guan C,Guan J Q,Yang B,Shen J C.Macromol Mater Eng,2003,288:717~723
[30] 22 Liu Y F,Lü C L,Li M J,Zhang L,Yang B.Colloids and Surfaces A:Physicochem Eng Aspects,2008,328:67~72
[31] 23 Liou G S,Lin P H,Yen H J,Yu Y Y,Tsai T W,Chen W C.J Mater Chem,2010,20:531~536
[32] 24 Liou G S,Lin P H,Yen H J,Yu Y Y,Chen W C.J Polym Sci:Part A:Polym Chem,2010,48:1433~1440
[33] 25 Liu B T,Tang S J,Yu YY,Lin S H.Colloids and Surfaces A:Physicochem Eng Aspects,2011,377:138~143
[34] 26 Xu K,Zhou S X,Wu L M.Progress in Organic Coatings,2010,67:302~310
[35] 31 Krogman K C,Druffel T,Sunkara M K.Nanotechnology,2005,16:S228~S343
[36] 32 Su H W,Chen W C.J Mater Chem,2008,18:1139~1145
[37] 36 Kim W S,Yoon K B,Bae B S.J Mater Chem,2005,15:4535~4539
Full-Text
Contact Us
service@oalib.com
QQ:3279437679
WhatsApp +8615387084133