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改善放大器噪声性能的SiGeHBT几何参数优化设计

Keywords: 硅锗异质结双极型晶体管,低噪声放大器,噪声系数

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Abstract:

研究有源器件SiGeHBT的几何参数对单片低噪声放大器(LNA)噪声性能的影响.基于0.35μmSiGeBiCMOS工艺,研制了4款采用不同几何参数的SiGeHBTLNA.实验结果显示,在给定的偏置条件下,当发射极宽长比较小时,小范围改变发射极宽度对噪声系数(NF)改善微弱,但适当增长发射极条长和增加发射极条数明显降低了NF,且不牺牲增益.另外,与采用其他几何尺寸的SiGeHBTLNAs相比,选用器件发射极面积为AE=4μm×40μm×4的LNA性能最优,在0.2~1.2GHz内获得低至2.7dB的噪声系数,高达26.7dB的相关增益和最接近于50Ω的最佳噪声源阻抗.由于没有使用占片面积大的电感,放大器芯片面积仅为0.2mm2.

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