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化工学报  2013 

膜分散微反应器沉淀法制备高孔容SiO2材料

DOI: 10.3969/j.issn.0438-1157.2013.06.050, PP. 2276-2284

Keywords: 消光剂,二氧化硅,高孔容,高比表面积,快速沉淀,膜分散微反应器

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