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金刚石厚膜的微结构研究

DOI: 10.11858/gywlxb.2008.03.007, PP. 265-268

Keywords: 金刚石厚膜,等离子体刻蚀,生长特性,晶界

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Abstract:

采用直流辉光等离子体化学气相沉积金刚石厚膜,利用氢的微波等离子体对抛光的金刚石厚膜截面进行刻蚀,用扫描电子显微镜、激光拉曼光谱仪研究了金刚石厚膜的微结构及杂质、缺陷的分布。结果表明:杂质、空洞主要富集在晶界处;在金刚石膜的生长过程中,随着甲烷流量的增加,晶界密度、空洞、晶粒内部缺陷、杂质含量逐渐增加,晶界的排列从以纵向为主过渡到网状结构。

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