A new patterning method using Deoxyribose Nucleic Acid (DNA) strands capable of producing nanogaps of less than 100 nm is proposed and investigated in this work. DNA strands from Bosenbergia rotunda were used as the fundamental element in patterning DNA on thin films of aluminium (Al) metal without the need for any lithographic techniques. The DNA strands were applied in buffer solutions onto thin films of Al on silicon (Si) and the chemical interactions between the DNA strands and Al creates nanometer scale arbitrary patterning by direct transfer of the DNA strands onto the substrate. This simple and cost-effective method can be utilized in the fabrication of various components in electronic chips for microelectronics and Nano Electronic Mechanical System (NEMS) applications in general.
References
[1]
Park, S; Kim, G; Choi, K; Lee, J. Fabrication of a 3D stamp with the micro- and nano-scale patterns through combined NIL and optical lithography processes. Microelectron. Eng 2010, 87, 8968–8971.
[2]
Tsvetkova, T; Takahashi, S; Zayats, A; Dawson, P; Turner, R; Bischoff, L; Angelov, O; Dimova-Malinovska, D. Nano-scale Cu metal patterning by using an atomic force microscope. Vacuum 2005, 79, 100–105, doi:10.1016/j.vacuum.2005.02.001.
[3]
Choi, KM; Rogers, JA. A photocurable poly (dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime. J. Am. Chem. Soc 2003, 125, 4060–4061, doi:10.1021/ja029973k. 12670222
Snow, ES; Campbell, PM; Perkins, FK. Nanofabrication with proximal probes. Proc. IEEE 1997, 85, 601–611, doi:10.1109/5.573744.
[6]
Lercel, MJ; Redinbo, GF; Craighead, HG; Sheen, CW; Allara, DL. Scanning tunneling microscopy based lithography of octadecanethiol on Au and GaAs. Appl. Phys. Lett 1994, 65, 974–976, doi:10.1063/1.113012.
[7]
Headrick, JE; Armstrong, M; Cratty, J; Hammond, S; Sheriff, BA; Berrie, CL. Nanoscale patterning of alkyl monolayers on silicon using the atomic force microscope. Langmuir 2005, 21, 4117–4122, doi:10.1021/la0481905. 15835982
[8]
Wacaser, BA; Maughan, MJ; Mowat, IA; Niederhauser, TL; Linford, MR; Davis, RC. Chemomechanical surface patterning and functionalization of silicon surfaces using an atomic force microscope. Appl. Phys. Lett 2003, 82, 808–810, doi:10.1063/1.1535267.
[9]
Black, AJ; Nealey, PF; Thywissen, JH; Despande, M; El-Zein, N; Maracas, GN; Prentiss, M; Whitesides, GM. Microfabrication of two layer structures of electrically isolated wires using self-assembly to guide the deposition of insulating organic polymer. Sens. Actuat 2000, 86, 96–102, doi:10.1016/S0924-4247(00)00422-2.
[10]
Winfree, E; Liu, F; Wenzler, LA; Seeman, NC. Design and self-assembly of two-dimensional DNA crystals. Nature 1998, 394, 539–544, doi:10.1038/28998. 9707114
[11]
Becerril, HA; Woolley, A. DNA shadow nanolithography. Small 2007, 3, 1534–1538, doi:10.1002/smll.200700240. 17705318
[12]
Lippert, GO; Blum, HJ; Sorge, K; Schley, R; Krüger, P; Fischer, D. Optimized processing for differentially molecular beam epitaxy-grown SiGe (C) devices. Thin Solid Films 1998, 321, 21–25, doi:10.1016/S0040-6090(98)00437-4.
[13]
Berashevich, J; Chakraborty, T. Water induced weakly bound electrons in DNA. J Chem Phys 2008, 128, 235101:1–235101:6.
[14]
Christophe, Y; Dominique, C; Tetsuya, T; Momoko, K; Aashiguchi, G; Hiroyuki, F. Humidity dependence of charge transport through DNA revealed by silicon-based nanotweezers manipulation. Biophys. J 2008, 94, 63–70, doi:10.1529/biophysj.107.115980. 17827222
