Numerical Analysis Of Spacial Field In Hot Filament Chemical Vapor Deposition Diamond Film
热丝化学气相沉积金刚石薄膜空间场的数值分析

Two--dimension coupled model of the temperature filed, velocity field and density field was developed according to the geometry and technology parameters in hot filament chemical vapor deposition (HFCVD) diamond film. The spacial field during large area diamond film deposition was simulated using this model to study the influence of deposited parameters. The calculated results about the temperature and the mass flow density on the substrate are consistent with experimented ones. The inlet gas velocity obviously affects the uniformity of the mass flow density, and the other deposited parameters have little influence on the distributions of the temperature and mass flow density. The optimal hot filament geometry parameters to deposit high quality diamond films with an area of 100mmx100 mm are gained on the basis of the minimum temperature along hot filament array.