PREPARATION AND MICROSTRUCTURE CHARACTERISTICS OF SUPER-HARD NANOCOMPOSITE Ti-Si-C-N COATING DEPOSITED BY PULSED DC PCVD
PCVD制备新型Ti-Si-C-N纳米复合超硬薄膜及其微观结构表征

Using an industrial pulsed DC plasma chemical vapor deposition set-up, Ti-Si-C-N coatings were deposited on substrate of high speed steel. The effect of SiCl4 flow rate on chemical composition, microstructure and phases in Ti-Si-C-N coatings was explored by means of XRD, XPS, TEM and SEM. It is suggested that Ti-Si-C-N coatings are of nanocomposite structure composed of nc-Ti(C, N)/a-C/a-Si3N4. The crystalline sizes are in the range of 2-25 nm. When nitrogen content in the coatings was very low, Ti(C, N) changed to TiC and the surface morphologies of Ti-Si-C-N coatings changed from granular grains to strip-shaped grains.