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金属学报  2006 

THE CHARACTERISTICS AND ANALYSIS OF THE SHEATH SCALING EVOLUTION IN PULSED BIAS ARC ION PLATING
脉冲偏压电弧离子镀鞘层尺度演化的特性与分析

Keywords: pulsed bias arc ion plating(PBAIP),sheath,evolution,numerical simulation
脉冲偏压电弧离子镀(PBAIP)
,鞘层,演化,数值模拟

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Abstract:

Based on a one-dimensional planar sheath model,the kinetic model of pulsed bias arc ion plating (PBAIP) sheath according to temporal evolvement and its analytic expression are presented.Combining the measured results of plasma parameters in PBAIP process,the temporal evolvement disciplinarian of the thickness of PBAIP sheath and ion current density in the sheath,and the effect of pulsed bias magnitude on sheath thickness and ion current are simulated and analyzed. The results indicate that both the thickness of stable-state sheath and the time of sheath formation are far less than the values reported by plasma source ion implantation (PSII).The expanding of the PBAIP sheath almost follows the real-time change of pulsed bias voltage,and the sheath thickness under pulsed bias voltage nearly equals to that under DC bias voltage.

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