Photoinduced Plasma Fresnel Zone Plate Antenna
光生等离子体菲涅尔波带板天线

The design method of a photoinduced plasma Fresnel zone plate antenna is described. A near infrared laser array with its central wavelength of 808 nm is used to illuminate a high resistivity silicon wafer through an optical mask (the negative of a Fresnel zone plate). Then, the illuminated silicon wafer exhibits the diffraction characteristics of the Fresnel zone plate and hence realizes the focusing of the incident millimeter wave. This anntena is verified experimentally at the frequency of 94GHz and its gain is up to 4dB.