|
|
材料研究学报 2005
The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films
|
Abstract:
The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAI film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P-C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10-4 Pa at ambient temperature.
