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APPLICATIONS OF X-RAY DOUBLE CRYSTAL DIFFRACTION TO INVESTGATION OF NEW MATERIALS
X 射线双晶衍射在新材料研究中的应用

Keywords: ion implantation,X-ray double-crystal diffraction,computer simulation
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,X,射线双晶衍射,计算机模拟

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Abstract:

The fundamental theory of X-ray double-crystal diffractometry is pres-ented in this paper.The applications of this technique to investigation or new structuralmaterials,which include ion implantation into semiconductor materials,single or multipleepitaxial layers,strained-layer superlattices and other new elctronic and optical materials,have been introduced.As the examples,the results of high energy B~+ implanted intoSi(100) wafer and In_xGa_(1-x)AS/GaAs strained-layer superlattice are also given.

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